Multiple wafer single bath etcher
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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Oct 24, 2017
Issued Date -
N/A
app pub date -
Dec 18, 2014
filing date -
Dec 18, 2014
priority date (Note) -
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Abstract
An etcher comprises a bath, a plurality of blades, and a tunnel. The bath includes a first electrode at a first end and a second electrode at a second end. The plurality of blades is configured to fit in the bath. At least one blade of the plurality of blades holds a wafer. At least one tunnel is configured to fit between adjacent blades of the plurality of blades in the bath.
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