Method of characterizing, method of forming a model, method of simulating, mask manufacturing method and device manufacturing method
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United States of America Patent
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Oct 24, 2017
Grant Date -
Sep 15, 2016
app pub date -
Oct 14, 2014
filing date -
Nov 5, 2013
priority date (Note) -
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Abstract
A method of characterizing a lithographic mask type uses a mask having thereon test pattern units of linear features at different orientations. The mask is exposed, rotated by angle, exposed again, rotated by a further angle, exposed, etc. The printed features are measured to determine one or more characteristics of the mask. The method can be used to model shadowing effects of a EUV mask with a thick absorber illuminated at an angle.
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