Thin-film photovoltaic device and fabrication method

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United States of America Patent

PATENT NO 9786807
SERIAL NO

14009558

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Abstract

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A method to fabricate thin-film photovoltaic devices including a photovoltaic Cu(In,Ga)Se2 or equivalent ABC absorber layer, such as an ABC2 layer, deposited onto a back-contact layer characterized in that the method includes at least five deposition steps, during which the pair of third and fourth steps are sequentially repeatable, in the presence of at least one C element over one or more steps. In the first step at least one B element is deposited, followed in the second by deposition of A and B elements at a deposition rate ratio Ar/Br, in the third at a ratio Ar/Br lower than the previous, in the fourth at a ratio Ar/Br higher than the previous, and in the fifth depositing only B elements to achieve a final ratio A/B of total deposited elements.

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Patent Owner(s)

Patent OwnerAddress
EMPAUEBERLANDSTRASSE 129 DÜBENDORF CH-8600
FLISOM AGGEWERBESTRASSE 16 NIEDERHASLI 8155

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bloesch, Patrick Oberwil Bei Büren, CH 1 1
Bremaud, David Uetikon am See, CH 2 13
Chirila, Adrian Herznach, CH 7 14
Nishiwaki, Shiro Dübendorf, CH 1 1
Tiwari, Ayodhya Nath Zürich, CH 7 24

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