Substrate electrolytic processing apparatus and paddle for use in such substrate electrolytic processing apparatus
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United States of America Patent
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Oct 10, 2017
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app pub date -
May 21, 2015
filing date -
May 26, 2014
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Abstract
A substrate electrolytic processing apparatus capable of leveling an electric-field shielding rate with no need to increase its size is disclosed. The substrate electrolytic processing apparatus includes a processing bath for holding a processing solution, a substrate holder for holding a substrate and capable of locating the substrate in the processing bath, a counter electrode disposed in the processing bath and serving as an electrode opposite to the substrate, and a paddle disposed between the counter electrode and the substrate and configured to reciprocate parallel to a surface of the substrate so as to agitate the processing solution. The paddle includes agitation rods disposed in an inner region of the paddle and agitation rods disposed in an outer region of the paddle, and gaps between the agitation rods disposed in the outer region is smaller than gaps between the agitation rods disposed in the inner region.
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