Simultaneous and selective wide gap partitioning of via structures using plating resist

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United States of America Patent

PATENT NO 9781830
SERIAL NO

14205337

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A multilayer printed circuit board is provided having a first dielectric layer and a first plating resist selectively positioned in the first dielectric layer. A second plating resist may be selectively positioned in the first dielectric layer or a second dielectric layer, the second plating resist separate from the first plating resist. A through hole extends through the first dielectric layer, the first plating resist, and the second plating resist. An interior surface of the through hole is plated with a conductive material except along a length between the first plating resist and the second plating resist. This forms a partitioned plated through hole having a first via segment electrically isolated from a second via segment.

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Patent Owner(s)

Patent OwnerAddress
SANMINA CORPORATION2700 NORTH FIRST STREET SAN JOSE CA 95134

International Classification(s)

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  • 2014 Application Filing Year
  • H05K Class
  • 5122 Applications Filed
  • 4182 Patents Issued To-Date
  • 81.65 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances201420152016201720182019202020212022202320240255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Dudnikov,, Jr George San Jose, US 9 107
Iketani, Shinichi San Jose, US 40 89
Kersten, Dale San Jose, US 15 72

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Patent Citation Ranking

  • 9 Citation Count
  • H05K Class
  • 18.22 % this patent is cited more than
  • 8 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges392138724467261388321101 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7071 - 8081 - 9091 - 100100 +0100200300400500600700800900100011001200130014001500

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