Silicon-on-insulator radio frequency device and silicon-on-insulator substrate

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United States of America Patent

PATENT NO 9780164
SERIAL NO

14134432

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Abstract

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A silicon-on-insulator radio frequency device and a silicon-on-insulator substrate are provided. In the silicon-on-insulator radio frequency device, a pit is formed on a surface of a high resistivity silicon plate which is close to a buried oxide layer. The pit may be filled with an insulating material, thereby increasing an equivalent surface resistance of the high resistivity silicon plate; or no insulating material is filled into the pit, that is, the pit remains a vacuum state or is only filled with air, which can increase the equivalent surface resistance of the high resistivity silicon plate as well. In such, an eddy current generated on a surface of the high resistivity silicon plate under the action of a radio frequency signal may be reduced. As a result, loss of the radio frequency signal is reduced and the linearity of the radio frequency signal is improved.

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Patent Owner(s)

Patent OwnerAddress
SHANGHAI HUAHONG GRACE SEMICONDUCTOR MANUFACTURING CORPORATIONNO 1399 ZU CHONG ZHI ROAD ZHANGJIANG HI-TECH PARK PUDONG NEW AREA SHANGHAI 201203

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Li, Ernest Shanghai, CN 6 18
Xu, Daniel Shanghai, CN 33 2922

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