Method of, and apparatus for, forming hard mask

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United States of America Patent

PATENT NO 9779958
SERIAL NO

14560659

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Abstract

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A method of forming a hard mask includes depositing step for depositing a titanium nitride film on a surface of a to-be-processed object; adsorbing step for adsorbing oxygen-containing molecules onto a surface of the titanium nitride film; and heating step for heating the titanium nitride film to a predetermined temperature.

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Patent Owner(s)

Patent OwnerAddress
ULVAC INC2500 HAGISONO CHIGASAKI-SHI KANAGAWA 253-8543

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Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances2014201520162017201820192020202120222023202420250255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Nakano, Katsuaki Chigasaki, JP 17 96

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Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges4219241045322915232201 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7071 - 8081 - 9091 - 100100 +0501001502002503003504004505005506006507007508008509009501000

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