Low contact imprint lithography template chuck system for improved overlay correction

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United States of America Patent

PATENT NO 9778578
SERIAL NO

14536069

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Abstract

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Imprint lithography template chucks and related systems and methods are provided that substantially maintain structural support functions while significantly enhancing imprint quality functions. The chucks incorporate dynamic vacuum seals to substantially reduce template contact during alignment and distortion correction while still providing good structural support upon separation.

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Patent Owner(s)

  • CANON NANOTECHNOLOGIES, INC.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bamesberger, Seth J Austin, US 30 44
Cherala, Anshuman Austin, US 49 706
Choi, Byung-Jin Austin, US 194 2163
Meissl, Mario Johannes Austin, US 38 151

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