Material deposition device and method of use
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United States of America Patent
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Oct 3, 2017
Grant Date -
Jun 9, 2016
app pub date -
Dec 5, 2014
filing date -
Dec 5, 2014
priority date (Note) -
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Abstract
A material deposition device includes a solution supply component, a gas supply component, and a co-axial discharge mechanism. The co-axial discharge mechanism includes a solution discharge mechanism, and a gas discharge mechanism co-axial with the solution discharge mechanism. The material deposition device further includes an alignment component that aligns the solution discharge mechanism in a center of the gas discharge mechanism; and an orifice plate with a number of turbulence inducing structures that induce turbulence in gas exiting the gas discharge mechanism.
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