Plasma ion source and charged particle beam apparatus
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United States of America Patent
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Sep 26, 2017
Grant Date -
Aug 18, 2016
app pub date -
Feb 10, 2016
filing date -
Feb 13, 2015
priority date (Note) -
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status (Latency Note)
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Abstract
A plasma ion source includes: a gas introduction chamber, into which raw gas is introduced; an insulation member provided in the gas introduction chamber; a plasma generation chamber connected to the gas introduction chamber; a coil that is wound along an outer circumference of the plasma generation chamber and to which high-frequency power is applied; and an electrode arranged at a boundary between the gas introduction chamber and the plasma generation chamber and having a plurality of through-holes formed therein, wherein a size of the through-holes is smaller than a length of a plasma sheath.
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Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Mar 26, 2025 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Mar 26, 2029 |
