Substrate carrier unit for a film deposition apparatus

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United States of America Patent

PATENT NO 9771649
SERIAL NO

14704422

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Abstract

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A substrate carrier unit includes a substrate carrier and a phase transition material. The substrate carrier defines an isolated space therein. The phase transition material is filled into the isolated space of the substrate carrier and has a melting point ranging between 18° C. and 95° C. The phase transition material is capable of absorbing thermal energy from the substrate carrier as latent heat to change the phase from solid to liquid.

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Patent Owner(s)

Patent OwnerAddress
LINCO TECHNOLOGY CO LTDNO 16 KEYUAN 1ST RD LINCUO VIL XITUN DIST TAICHUNG CITY

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chang, Tsung-Wei Taichung, TW 5 1
Huang, Wan-Yu Keelung, TW 6 13
Huang, Yi-Yuan Taichung, TW 9 3
Lu, Mu-Sen Taichung, TW 3 1
Su, Huei-Chia Taichung, TW 2 1
Yeh, Cheng-Peng Changhua, TW 2 1
Yeh, Chung-Yu Taichung, TW 3 6

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