Method of manufacturing chemical mechanical polishing pads
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United States of America Patent
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Sep 26, 2017
Grant Date -
Jul 13, 2017
app pub date -
Jan 12, 2016
filing date -
Jan 12, 2016
priority date (Note) -
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Abstract
A method of manufacturing chemical mechanical polishing pads is provided, wherein an automated inspection system is configured to detect macro inhomogeneities is skived sheets and to classify the skived sheets as either acceptable or suspect; wherein the acceptable skived sheets are further processed to form polishing layers of chemical mechanical polishing pads.
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International Classification(s)
- B24B:MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR PO....
- B26D:CUTTING; DETAILS COMMON TO MACHINES FOR SEVERING, ....
- B29C:SHAPING OR JOINING OF PLASTICS; SHAPING OF SUBSTAN....
- G01N:INVESTIGATING OR ANALYSING MATERIALS BY DETERMININ....
- B29K:INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, ....
- B29L:INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RE....
- B24D:TOOLS FOR GRINDING, BUFFING, OR SHARPENING
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