Apparatus for treating a gas in a conduit
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United States of America Patent
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Sep 19, 2017
Grant Date -
Oct 13, 2016
app pub date -
Jun 21, 2016
filing date -
May 29, 2014
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Abstract
Apparatus for treating a gas in a conduit of a substrate processing system are provided. In some embodiments, an apparatus for treating a gas in a conduit of a substrate processing system includes: a dielectric tube configured to be coupled to a conduit of a substrate processing system to allow a flow of gases through the dielectric tube, wherein the dielectric tube has a conical sidewall; and a radio frequency (RF) coil wound about an outer surface of the conical sidewall of the dielectric tube. In some embodiments, the RF coil is hollow and includes coolant fittings to couple the hollow RF coil to a coolant supply.
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