Multi field point aberration parallel metrology device and method for lithographic projection lens
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United States of America Patent
Stats
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Sep 19, 2017
Grant Date -
May 11, 2017
app pub date -
Dec 30, 2015
filing date -
Nov 9, 2015
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A multi field point aberration parallel detection device for a lithographic projection lens and a detection method therefor, having a spatial light modulator that is respectively arranged on the object plane and the image plane of the projection lens under test, wherein the object plane spatial light modulator and the image plane spatial light modulator are respectively disposed as an object plane grating set comprising multiple one-dimensional gratings and an image plane grating set comprising multiple two-dimensional gratings via computer programming. The gratings in the object plane grating set and the image plane grating set are conjugate one to another in respect of the projection lens under test, with each pair of conjugate grating being measured for the wave aberration of a field point.
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Patent Citation Ranking
- 2 Citation Count
- G01M Class
- 21.64 % this patent is cited more than
- 8 Age
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