Anodic oxide film structure cutting method and unit anodic oxide film structure
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United States of America Patent
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Sep 19, 2017
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Sep 8, 2016
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Sep 21, 2015
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Abstract
An anodic oxide film structure cutting method is provided. The method includes: an etching step of forming an etched groove by etching one surface of an anodic oxide film having a plurality of anodizing pores along a predetermined cutting line and forming increased-diameter pores by enlarging entrances of the anodizing pores positioned on an inner bottom surface of the etched groove; and a cutting step of cutting the anodic oxide film along the etched groove. Also provided is a unit anodic oxide film structure produced by the cutting method.
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