Reticle shape regulation device and method, and exposure apparatus using same

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United States of America Patent

PATENT NO 9760025
APP PUB NO 20160147163A1
SERIAL NO

14900073

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Abstract

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A reticle shape regulation device includes: an adsorption device having an upper surface and a lower surface; and a limit mechanism having a limit surface. The adsorption device is movable relative to the limit mechanism at least in a vertical direction. The upper surface of the adsorption device faces toward and is engagable with the limit surface. The lower surface of the adsorption device defines a vacuum chamber that is configured for communication with a negative-pressure source so as to adsorb the reticle by a negative pressure. The lower surface of the adsorption device further defines at least one positive-pressure outlet that is in communication with a positive-pressure source and is configured to supply a continuous positive-pressure air flow between the lower surface of the adsorption device and the reticle during the adsorption of the reticle. The positive-pressure air flow is so controlled as to form an air cushion between the lower surface of the adsorption device and the reticle while allowing the adsorption of the reticle by the adsorption device. This can correct deformations of the reticle, thus enabling satisfactory flatness thereof during an exposure process, and can easily create vacuum and an air cushion between a deformed reticle and the adsorption device.

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Patent Owner(s)

Patent OwnerAddress
SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO LTD201203 NO 1525 EAST CHEUNG ROAD SHANGHAI PUDONG NEW AREA MUNICIPAL DISTRICT SHANGHAI CITY 201203

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Jiang, Xuchu Shanghai, CN 3 2
Wang, Xiaogang Shanghai, CN 108 1047
Wang, Xinxin Shanghai, CN 112 105
Zhu, Wenjing Shanghai, CN 5 1

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