Lithography machine workpiece table and vertical position initialization method thereof

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 9760022
APP PUB NO 20170017168A1
SERIAL NO

15122019

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ATTORNEY / AGENT: (SPONSORED)

Importance

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Abstract

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A fine-motion module for use in a wafer stage of a photolithography tool includes: a base (201); a fine-motion plate (210); a plurality of vertical motors (203), fixed between the base and the fine-motion plate; a plurality of gravity compensators (202), each having one end fixed on the base and the other end configured to support the fine-motion plate; a plurality of absolute-position sensors (205, 211), configured to measure an absolute position of the fine-motion plate and to adjust pressures in the gravity compensators based on the obtained absolute-position measurements such that the absolute position of the fine-motion plate is changed to a predetermined initial vertical position; and a plurality of relative-position sensors (204, 207), configured to measure a relative position of the fine-motion plate to the base and to control the fine-motion plate based on the obtained relative-position measurements, thereby moving the fine-motion plate to a relative zero position.

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Patent Owner(s)

Patent OwnerAddress
SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO LTD201203 NO 1525 EAST CHEUNG ROAD SHANGHAI PUDONG NEW AREA MUNICIPAL DISTRICT SHANGHAI CITY 201203

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hu, Shuping Shanghai, CN 11 28
Jia, Haili Shanghai, CN 1 3
Liao, Feihong Shanghai, CN 2 3
Zhu, Yuebin Shanghai, CN 7 12

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