Efficient solution for removing EUV native defects
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United States of America Patent
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Sep 12, 2017
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N/A
app pub date -
Jun 3, 2016
filing date -
Jun 30, 2014
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Abstract
The present disclosure relates to a method and apparatus for mitigating printable native defects in an extreme ultra violet (EUV) mask substrate. In some embodiments, the method is performed by identifying a printable native defect within an EUV mask substrate that violates one or more sizing thresholds. A first section of the EUV mask substrate including the printable native defect is removed to form a concavity within the EUV mask substrate. A multi-layer replacement section that is devoid of a printable native defect is inserted into the concavity.
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