Retainer for gas processing device, gas processing device, and manufacturing methods therefor

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 9759112
APP PUB NO 20140248189A1
SERIAL NO

14237295

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Abstract

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A gas processing device is disclosed that makes it possible to appropriately control the frictional resistance between a holding mat and a casing. A gas processing device (1) includes a processing structure (20), a casing (40) made of a metal and housing the processing structure (20), and a holding mat (10) formed of inorganic fibers and placed between the processing structure (20) and the casing (40), an inner surface (41) of the casing (40) and an outer surface (11) of the holding mat (10) coming in contact with each other through an adhesive layer (12) that includes a compound that includes a structural unit represented by a general formula (I).

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Patent Owner(s)

Patent OwnerAddress
NICHIAS CORPORATIONTOKYO 104-8555

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Nakamura, Hiroki Tokyo, JP 382 4527
Sakane, Tadashi Tokyo, JP 14 179
Tomosue, Nobuya Tokyo, JP 13 135

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