Organoaminosilanes and methods for making same
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United States of America Patent
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Sep 12, 2017
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app pub date -
Dec 2, 2015
filing date -
Feb 28, 2014
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Abstract
Organoaminosilanes, such as without limitation di-iso-propylaminosilane (DIPAS), are precursors for the deposition of silicon containing films such as silicon-oxide and silicon-nitride films. Described herein are methods to make organoaminosilane compounds, or other compounds such as organoaminodisilanes and organoaminocarbosilanes, via the catalytic hydrosilylation of an imine by a silicon source comprising a hydridosilane.
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