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United States of America Patent
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Sep 12, 2017
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app pub date -
Sep 6, 2013
filing date -
Sep 10, 2012
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Abstract
Elemental fluorine is often manufactured electrochemically from a solution of KF in hydrogen fluoride and contains varying amounts of HF as impurity. The present invention provides a method for chamber cleaning using F2 which contains more than 0.1% by weight and equal to or less than 10% by weight of HF. Surprisingly, such an F2 is very well suited for the purpose of chamber cleaning. In a preferred embodiment, the F2 which contains more than 0.1% by weight and less than 2.5% by weight of HF is electrolytically produced, cleaned, delivered and used on site, without any pressurizing treatment. Omitting cleaning steps and process and using process conditions leaving a relatively high HF content in the F2 allows at the same time to omit pressurizing steps. The advantage is that less cleaning steps.
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