Electrostatic multipole device, electrostatic multipole arrangement, and method of manufacturing an electrostatic multipole device
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United States of America Patent
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Sep 5, 2017
Issued Date -
N/A
app pub date -
Nov 20, 2015
filing date -
Nov 20, 2015
priority date (Note) -
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Abstract
An electrostatic multipole device for influencing a charged particle beam propagating along an optical axis is described. The electrostatic multipole device comprises a substrate with at least one aperture opening for the charged particle beam, which extends along the optical axis through the substrate, and four or more electrodes which are formed on a first main surface of the substrate to influence the charged particle beam propagating through the aperture opening, wherein each of the four or more electrodes is arranged at a radial distance from a beam limiting edge of the aperture opening. Further, a method of manufacturing an electrostatic multipole device is described.
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