Visible light photoinitiating system for preparing high diffraction efficiency hologram optical polymer material

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United States of America Patent

PATENT NO 9753431
SERIAL NO

14131676

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Abstract

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The present invention provides a visible light photoinitiating system for preparing a holographic photopolymer material with high-diffraction efficiency. The photoinitiating system comprises a photosensitizer and a co-initiator, and its mechanism is that the photosensitizer transforms from ground state to excited state after absorbing photons, and then interacts with the co-initiator through transfer of electrons and protons, which produces an alkyl (or aryl) free radical R and a ketyl radical K; wherein the free radical R initiates the addition polymerization of monomers that are capable of free radical polymerization, whereas the radical K inhibits the chain propagation of the macromolecular free radicals to a certain degree due to the steric hindrance effect, and thus delays the gelation time of the photopolymerization, which helps to increase the phase separation between the polymer and the functional components. A holographic photopolymer material with high-diffraction efficiency can be obtained by employing this visible light photoinitiating system.

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Patent Owner(s)

Patent OwnerAddress
HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY430074 HUBEI PROVINCE WUHAN CITY HONGSHAN DISTRICT LUOYU ROAD NO 1037 WUHAN CITY HUBEI PROVINCE 430074

International Classification(s)

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  • 2012 Application Filing Year
  • C08F Class
  • 1687 Applications Filed
  • 1416 Patents Issued To-Date
  • 83.94 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances201220132014201520162017201820192020202120220255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ge, Hongwei Wuhan, CN 5 29
Peng, Haiyan Wuhan, CN 10 24
Xie, Xiaolin Wuhan, CN 31 43
Zheng, Chengfu Wuhan, CN 2 24
Zhou, Xingping Wuhan, CN 8 25

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Patent Citation Ranking

  • 1 Citation Count
  • C08F Class
  • 30.09 % this patent is cited more than
  • 8 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges5171071902496101 - 1011 - 2021 - 3031 - 4041 - 50100 +0501001502002503003504004505005506006507007508008509009501000105011001150

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