Deposition method

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United States of America Patent

PATENT NO 9752227
APP PUB NO 20150376771A1
SERIAL NO

14626220

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Abstract

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A deposition method includes: introducing a gas into an airtight container containing electrically insulated raw material particles to generate an aerosol of the raw material particles; transferring the aerosol to a deposition chamber through a transfer tubing connected to the airtight container, the deposition chamber having a pressure maintained to be lower than that of the airtight container; injecting the aerosol from a nozzle mounted on a tip of the transfer tubing toward a target placed on the deposition chamber to cause the raw material particles to collide with the target, thereby causing the raw material particles to be positively charged; generating fine particles of the raw material particles by discharge of the charged raw material particles; and depositing the fine particles on a substrate placed on the deposition chamber.

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Patent Owner(s)

Patent OwnerAddress
FUCHITA NANOTECHNOLOGY LTDNARITA-SHI CHIBA 286-0011

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fuchita, Eiji Chiba, JP 10 40
Ozawa, Eiichi Chiba, JP 7 48
Tokizaki, Eiji Chiba, JP 5 6

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