Apparatus and method for generation of high harmonics from silicon
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United States of America Patent
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Aug 29, 2017
Issued Date -
N/A
app pub date -
Oct 28, 2016
filing date -
Oct 30, 2015
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A method and apparatus is disclosed for generating tunable attosecond-scale radiation pulses, with a frequency in range of mid-infrared to ultra-violet, from a silicon medium. The invention utilizes an intense laser pulse to drive a high harmonic generation (HHG) process in a silicon medium and a weak secondary field to control the HHG process. The weak secondary field has a frequency equal to the second harmonic of the intense laser pulse. The spatial, temporal and spectral properties of the HHG process and the emitted harmonic beam are tuned by adjusting the relative delay between the two fields and the intensity of the weak secondary field.
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Patent Citation Ranking
- 3 Citation Count
- G02F Class
- 15.46 % this patent is cited more than
- 8 Age
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