Method for forming thin film conductors on a substrate

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United States of America Patent

PATENT NO 9743516
SERIAL NO

13692570

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Abstract

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A method for forming thin film conductors is disclosed. A thin film precursor material is initially deposited onto a porous substrate. The thin film precursor material is then irradiated with a light pulse in order to transform the thin film precursor material to a thin film such that the thin film is more electrically conductive than the thin film precursor material. Finally, compressive stress is applied to the thin film and the porous substrate to further increase the thin film's electrical conductivity.

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Patent Owner(s)

Patent OwnerAddress
NCC NANO LLC12221 MERIT DRIVE THREE FOREST PLAZA SUITE DALLAS TX 75251

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Edd, Andrew E Austin, US 2 12
Munson, Charles C Dallas, US 3 10

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