Bonding apparatus and bonding process method

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United States of America Patent

PATENT NO 9741596
APP PUB NO 20140182761A1
SERIAL NO

14138196

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Abstract

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According to one embodiment, a bonding apparatus for processing a retained substrate includes a main body unit, a nozzle, a gas supply unit, and a substrate support unit. The nozzle opens on a face of the main body unit on a side that a first substrate is retained. The gas supply unit is configured to supply gas to the nozzle, to apply suction to the first substrate and to separate the substrate from the face of the main body unit. The substrate support unit is configured to support a peripheral edge portion of a second substrate provided in opposition to the first substrate with a predetermined gap.

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Patent Owner(s)

Patent OwnerAddress
SHIBAURA MECHATRONICS CORPORATION5-1 KASAMA 2-CHOME SAKAE-KU YOKOHAMA-SHI KANAGAWA 247-8610

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hayashi, Konosuke Kanagawa-ken, JP 29 113
Matsui, Emi Kanagawa-ken, JP 6 22

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