Plasma processing apparatus, plasma processing method, and method for manufacturing electronic device
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United States of America Patent
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Aug 22, 2017
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app pub date -
Mar 18, 2016
filing date -
Apr 2, 2015
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Abstract
Linear coils, a first ceramic block, and a second ceramic block are arranged in an inductively-coupled plasma torch. A chamber has an annular shape. Plasma generated inside the chamber is ejected to a substrate through an opening portion in the chamber. The substrate is processed by relatively moving the chamber and the substrate in a direction perpendicular to a longitudinal direction of the opening portion. The coil is arranged inside a rotating cylindrical ceramic pipe. Accordingly, the plasma can be generated with excellent power efficiency, and fast plasma processing can be performed.
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