High aspect ratio structure analysis
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United States of America Patent
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Aug 22, 2017
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N/A
app pub date -
Oct 4, 2013
filing date -
Oct 5, 2012
priority date (Note) -
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Abstract
Curtaining artifacts on high aspect ratio features are reduced by reducing the distance between a protective layer and feature of interest. For example, the ion beam can mill at an angle to the work piece surface to create a sloped surface. A protective layer is deposited onto the sloped surface, and the ion beam mills through the protective layer to expose the feature of interest for analysis. The sloped mill positions the protective layer close to the feature of interest to reduce curtaining.
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