Chemically amplified negative resist composition using novel onium salt and resist pattern forming process
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United States of America Patent
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Aug 22, 2017
Issued Date -
Oct 13, 2016
app pub date -
Apr 8, 2016
filing date -
Apr 13, 2015
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Abstract
A chemically amplified negative resist composition is defined as comprising (A) an onium salt having an anion moiety which is a nitrogen-containing carboxylate of fused ring structure, (B) a base resin, and (C) a crosslinker. The resist composition is effective for controlling acid diffusion during the exposure step, exhibits a very high resolution during pattern formation, and forms a pattern with minimal LER.
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