Arrangement in a thermal process, and a method for measuring the thickness of a contamination layer
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United States of America Patent
Stats
-
Aug 22, 2017
Issued Date -
N/A
app pub date -
Nov 25, 2013
filing date -
Dec 5, 2012
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
An arrangement of a thermal device and a surface reflecting and/or scattering electromagnetic radiation in the inner part of the thermal device. A source of electromagnetic radiation is arranged at a first distance (L1) from the surface, and a detector of electromagnetic radiation is arranged at a second distance (L2) from the surface. The source is configured to emit radiation to the surface, which is reflected and/or scattered from the surface as reflected radiation. The detector receives reflected radiation; and the processing unit determines data dependent on the first and/or second distance by the emitted and reflected radiation. A wall of the thermal device has a window or aperture for emitting an optical signal from the light source to the surface. An electromagnetic distance measurement device measures the thickness or the increase in the thickness of a contamination layer from a thermal device.
First Claim
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International Classification(s)
- 2013 Application Filing Year
- F23J Class
- 91 Applications Filed
- 75 Patents Issued To-Date
- 82.42 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- F23J Class
- 0 % this patent is cited more than
- 8 Age
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