Multilayer crown-shaped MIM capacitor and manufacturing method thereof

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United States of America Patent

PATENT NO 9735228
SERIAL NO

14986717

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Abstract

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A multi-layer, crown-shaped MIM capacitor includes a base having therein conductive region, an inter-metal dielectric (IMD) layer on the base, a capacitor trench penetrating through the IMD layer and exposing the conductive region, a capacitor lower electrode structure including a first electrode and a second electrode surrounded by the first electrode, a conductive supporting pedestal within the capacitor trench for fixing and electrically connecting the bottom portions of the first and second electrodes, a capacitor dielectric layer conformally lining the first and second electrodes and a top surface of the conductive supporting pedestal, and a capacitor upper electrode on the capacitor dielectric layer.

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Patent Owner(s)

Patent OwnerAddress
POWERCHIP SEMICONDUCTOR MANUFACTURING CORPORATIONHSINCHU

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Che, Shyng-Yeuan Hsinchu County, TW 13 8
Wong, Wen-Yi Kinmen County, TW 3 4

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