Plasma processing apparatus

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United States of America Patent

PATENT NO 9728379
SERIAL NO

13119106

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Abstract

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A plasma processing apparatus (5) comprises an outer shell (51) which is provided with a reaction chamber (52) in the interior, a bottom electrode which is arranged in the reaction chamber (52) and a cantilever support device (53) which goes through the outer shell (51) and supports the bottom electrode. The cantilever support device (53) is pivotally mounted on the side wall of the outer shell (51) and can rotate in the outer shell (51). The plasma processing apparatus (5) further comprises a locating device so as to selectively fix the relative position of the cantilever support device (53) and the outer shell (51).

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Patent Owner(s)

Patent OwnerAddress
BEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD100176 8 WENCHANG AVENUE BEIJING ECONOMIC AND TECHNOLOGICAL DEVELOPMENT ZONE BEIJING BEIJING CITY BEIJING CITY 100176

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Zhang, Fenggang Beijing, CN 7 11

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