Patterning device, method of producing a marker on a substrate and device manufacturing method
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United States of America Patent
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Aug 8, 2017
Issued Date -
N/A
app pub date -
Mar 6, 2014
filing date -
Mar 14, 2013
priority date (Note) -
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status (Latency Note)
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Abstract
A patterning device, for use in forming a marker on a substrate by optical projection, the patterning device including a marker pattern having a density profile that is periodic with a fundamental spatial frequency corresponding to a desired periodicity of the marker to be formed. The density profile is modulated (such as sinusoidally) so as to suppress one or more harmonics of the fundamental frequency, relative to a simple binary profile having the fundamental frequency.
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Cited Art Landscape
Patent Citation Ranking
- 1 Citation Count
- G03F Class
- 21.07 % this patent is cited more than
- 8 Age
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