Lithography mask repair methods

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United States of America Patent

PATENT NO 9726990
SERIAL NO

13782019

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Abstract

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Lithography mask repair methods are disclosed. In one embodiment, a method of repairing a lithography mask includes providing a lithography mask, exposing a back side of the lithography mask to vacuum ultraviolet (VUV) energy, and cleaning the lithography mask.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANYNO 8 LI-HSIN RD 6 SCIENCE-BASED INDUSTRIAL PARK HSIN-CHU 300-77

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hsieh, Kun-Lung Kaohsiung, TW 23 25
Ko, Wu Hung Tainan, TW 3 8

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