Electron beam plasma source with reduced metal contamination

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United States of America Patent

PATENT NO 9721760
SERIAL NO

13912488

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Abstract

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In a plasma reactor for processing a workpiece, an electron beam is employed as the plasma source, and sputtered metal atoms are removed from the electron beam to reduce contamination.

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Patent Owner(s)

Patent OwnerAddress
APPLIED MATERIALS INC3050 BOWERS AVENUE SANTA CLARA CA 95054

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Carducci, James D Sunnyvale, US 109 4234
Collins, Kenneth S San Jose, US 310 28285
Dorf, Leonid San Jose, US 74 1603
Lane, Steven Porterville, US 70 1198
Misra, Nipun San Jose, US 18 610
Monroy, Gonzalo Antonio San Francisco, US 17 653
Ramaswamy, Kartik San Jose, US 371 20119
Rauf, Shahid Pleasanton, US 151 5635

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