Pattern definition of nanocellulose sheets through selective ashing via lithographic masking

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United States of America Patent

PATENT NO 9720318
SERIAL NO

15361171

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Abstract

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A masked etching process can prepare patterned nanocellulose for use in conformal electronics such as electrodermal structures might be adhered to human skin.

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Patent Owner(s)

Patent OwnerAddress
THE GOVERNMENT OF THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE NAVYONE LIBERTY CTR 875 NORTH RANDOLPH ST SUITE 1425 CHIEF OF NAVAL RESEARCH OFFICE OF COUNSEL (ATTN CODE OOCCIP) ARLINGTON VA 22203

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Daniele, Michael A Raleigh, US 7 10
Yuen, Jonathan D Washington, US 6 4

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