Immersion photolithography system and method using microchannel nozzles
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United States of America Patent
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Jul 25, 2017
Issued Date -
N/A
app pub date -
Apr 30, 2014
filing date -
Jun 19, 2003
priority date (Note) -
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Abstract
A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow in an area where the substrate is being exposed.
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