Super-junction semiconductor device
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United States of America Patent
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Jul 18, 2017
Grant Date -
Jun 22, 2017
app pub date -
Apr 25, 2016
filing date -
Dec 18, 2015
priority date (Note) -
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Abstract
A super-junction semiconductor device is provided. The super-junction semiconductor device includes a substrate, a drift layer, a field insulator, a floating electrode layer, an isolation layer, and at least one transistor structure. The drift layer includes a plurality of n-type and p-type pillars alternately arranged in parallel to form a super-junction structure. An active region, a termination region and a transition region located therebetween are defined in the drift layer. The field insulator disposed on a surface of the drift layer covers the termination region and a portion of the transition region. The floating electrode layer disposed on the field insulator partially overlaps with the termination region. The transistor structure includes a source conductive layer extending from the active region to the transition region and superimposed on a portion of the floating electrode layer. The source conductive layer is isolated from the floating electrode layer by the isolation layer.
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