Inert atmospheric pressure pre-chill and post-heat

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United States of America Patent

PATENT NO 9711324
APP PUB NO 20130320208A1
SERIAL NO

13485186

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Abstract

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An ion implantation system provides ions to a workpiece positioned in a process environment of a process chamber on a sub-ambient temperature chuck. An intermediate chamber having an intermediate environment is in fluid communication with an external environment and has a cooling station and heating station for cooling and heating the workpiece. A load lock chamber is provided between the process chamber and intermediate chamber to isolate the process environment from the intermediate environment. A positive pressure source provides a dry gas within the intermediate chamber at dew point that is less than a dew point of the external environment to the intermediate chamber. The positive pressure source isolates the intermediate environment from the external environment via a flow of the dry gas from the intermediate chamber to the external environment.

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Patent Owner(s)

Patent OwnerAddress
AXCELIS TECHNOLOGIES INC108 CHERRY HILL DRIVE BEVERLY MA 01915

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Drummond, Steve Merrimac, US 5 38
Lee, William D Newburyport, US 27 298

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Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges6221535185612511122323201 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7071 - 8081 - 9091 - 100100 +010020030040050060070080090010001100120013001400150016001700

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