Polarization control of pulsed light beam
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United States of America Patent
Stats
-
Jul 18, 2017
Issued Date -
N/A
app pub date -
Oct 28, 2015
filing date -
Oct 28, 2015
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A photolithography system includes an optical system, an actuation apparatus, and a control module. The optical system includes an optical source that produces a pulsed light beam traveling along a beam path; a plurality of optical components positioned between the optical source and a photolithography exposure apparatus, at least some of the plurality of optical components configured to receive the pulsed light beam and direct the pulsed light beam to the photolithography exposure apparatus; and an optical element positioned to interact with the pulsed light beam. The actuation apparatus is coupled to the optical element. The actuation apparatus is configured to adjust a physical property of the optical element based on a control signal from the control module to thereby adjust a polarization of the pulsed light beam.
First Claim
Other Claims data not available
Family
International Classification(s)
- 2015 Application Filing Year
- G03B Class
- 1999 Applications Filed
- 1737 Patents Issued To-Date
- 86.90 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 1 Citation Count
- G03B Class
- 18.75 % this patent is cited more than
- 8 Age
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