Nanolayer deposition using bias power treatment
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United States of America Patent
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Jul 18, 2017
Grant Date -
Nov 11, 2010
app pub date -
May 19, 2010
filing date -
Sep 10, 2001
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Abstract
A hybrid deposition process of CVD and ALD, called NanoLayer Deposition (NLD) is provided. The NLD process is a cyclic sequential deposition process, comprising introducing a first plurality of precursors to deposit a thin layer with the deposition process not self limiting, followed by introducing a second plurality of precursors for plasma treating the thin deposited layer. The plasma can be isotropic, anisotropic, or a combination of isotropic and anisotropic to optimize the effectiveness of the treatment of the thin deposited layers.
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