EUV light source and exposure apparatus
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jul 11, 2017
Issued Date -
N/A
app pub date -
Oct 16, 2015
filing date -
Oct 16, 2014
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
An extreme ultraviolet (EUV) light source is provided. The EUV light source comprises a spray nozzle array having a plurality of spray nozzles configured to spray a plurality of rows of droplets to an irradiating position; a laser source configured to generate a first laser beam and a second laser beam and cause the first laser beam and the second laser beam to alternately bombard the rows of droplets to generate EUV light with increased output power; a focusing mirror having at least two first sub-focusing mirrors and at least two second sub-focusing mirrors; and a first driving device having at least two first sub-driving device and at least two second sub-driving device, each of first driving devices driving one of the first sub-focusing mirrors and each of the second sub-driving devices driving one of the second sub-focusing mirrors.
First Claim
Other Claims data not available
Family
International Classification(s)
- 2015 Application Filing Year
- G21K Class
- 287 Applications Filed
- 220 Patents Issued To-Date
- 76.66 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- G21K Class
- 0 % this patent is cited more than
- 8 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Jan 11, 2025 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Jan 11, 2029 |
