Mask set, fabrication method of mask set, manufacturing method of semiconductor device, and recording medium
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United States of America Patent
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Jul 11, 2017
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N/A
app pub date -
Jun 23, 2015
filing date -
Mar 10, 2015
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Abstract
According to one embodiment, there is provided a mask set including a first mask and a second mask. The first mask includes a first device pattern and a first mark pattern. The first mark pattern is used for an inspection of a position of the first device pattern on a surface of the first mask. The second mask is used to perform multiple exposure on a substrate together with the first mask. The second mask includes a second device pattern and a second mark pattern. The second mark pattern is used for an inspection of a position of the second device pattern on a surface of the second mask. The second mark pattern includes a pattern corresponding to a pattern obtained by inverting the first mark pattern.
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