Onium salt, resist composition, and patterning process

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United States of America Patent

PATENT NO 9703193
APP PUB NO 20160320698A1
SERIAL NO

15139780

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Abstract

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An onium salt having an anion moiety of a specific structure is an effective photoacid generator. A resist composition comprising the onium salt has the advantages of compatibility and reduced acid diffusion and forms a pattern with a good balance of sensitivity and MEF, rectangularity, and minimal defects.

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Patent Owner(s)

Patent OwnerAddress
SHIN-ETSU CHEMICAL CO LTDTOKYO JAPAN TOKYO METROPOLIS

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fujiwara, Takayuki Joetsu, JP 155 990
Ohashi, Masaki Joetsu, JP 190 2040
Taniguchi, Ryosuke Joetsu, JP 44 419

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