Halogenated polysilane and plasma-chemical process for producing the same

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United States of America Patent

PATENT NO 9701795
APP PUB NO 20110150740A1
SERIAL NO

12995173

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Abstract

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The present invention relates to a halogenated polysilane as a pure compound or a mixture of compounds each having at least one direct Si—Si bond, whose substituents consist exclusively of halogen or of halogen and hydrogen and in the composition of which the atomic ratio of substituent to silicon is at least 1:1.

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Patent Owner(s)

Patent OwnerAddress
NAGARJUNA FERTILIZERS AND CHEMICALS LIMITEDHYDERABAD 500082

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Auner, Norbert Glashuetten, DE 54 90
Bauch, Christian Bitterfeld-Wolfen, DE 32 65
Deltschew, Rumen Leipzig, DE 26 60
Lippold, Gerd Leipzig, DE 21 55
Mohsseni-Ala, Seyed-Javad Bitterfeld-Wolfen, DE 5 16

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