Apparatus of plural charged-particle beams
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United States of America Patent
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Jun 27, 2017
Grant Date -
Sep 15, 2016
app pub date -
Mar 9, 2016
filing date -
Mar 10, 2015
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Abstract
A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.
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