Substrate processing apparatus, method of manufacturing semiconductor device, and method of generating recipe
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United States of America Patent
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Jun 27, 2017
Grant Date -
Mar 13, 2014
app pub date -
Sep 10, 2013
filing date -
Sep 12, 2012
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Abstract
Provided is a method of automatically setting, in a recipe, a process parameter (PP) according to the number of substrates to be processed. The method includes (a) displaying a process parameter of a process recipe on a display unit; (b) displaying a parameter name in a process parameter file on the display unit; (c) generating a first recipe by substituting the process parameter with the parameter name; (d) downloading the first recipe and one of a plurality of condition tables corresponding to the selected number of substrates when the number of substrates to be processed in a processing chamber is selected; and (e) generating a second recipe by substituting the process parameter of the downloaded one of the condition tables for the parameter name in the downloaded first recipe.
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