Negative-working photosensitive siloxane composition
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United States of America Patent
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Jun 20, 2017
Grant Date -
Nov 19, 2015
app pub date -
Apr 5, 2013
filing date -
Apr 6, 2012
priority date (Note) -
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Abstract
To provide a negative-working photosensitive siloxane composition developable inorganically, and also to provide a cured film-manufacturing method employing that. The present invention provides a negative-working photosensitive siloxane composition comprising a polysiloxane, a silicon-containing compound having an ureido bond, a polymerization initiator, and a solvent. This composition is coat on a substrate, exposed to light, and developed, so that a cured film can be obtained without carrying out post-exposure baking.
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