Group-III nitride structure including a fine wall-shaped structure containing a group-III nitridesemiconductor crystal and method for producing a group-III nitride structure including a fine wall-shaped structure containing a group-III nitride semiconductor crystal

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United States of America Patent

PATENT NO 9680058
APP PUB NO 20100252836A1
SERIAL NO

12744648

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Abstract

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A group-III nitride structure includes a substrate 102 and a fine wall-shaped structure 110 disposed to stand on the substrate 102 in a vertical direction relative to a surface of the substrate 102 and extending in an in-plane direction of the substrate 102. The fine wall-shaped structure 110 contains a group-III nitride semiconductor crystal, and h is larger than d assuming that the height of the fine wall-shaped structure 110 is h and the width of the fine wall-shaped structure 110 in a direction perpendicular to the height direction and the extending direction is d.

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Patent Owner(s)

  • SOPHIA SCHOOL CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kikuchi, Akihiko Tokyo, JP 18 316
Kishino, Katsumi Tokyo, JP 46 252

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